SRV Series | Kouei Japan Trading

Shinko Seiki SRV Series Sputtering System For R & D

Manufacturer: Shinko Seiki Co., Ltd.
Model: SRV Series

Specifications

Model	SRL3320	SDL4320	STL5520
	Parallel plate type	Parallel plate type	Parallel plate type
Target	Cathode type
	Planar magnetron	Planar magnetron	Planar magnetron
	Size × Quantity
	φ 75 mm × 3	φ 100 mm × 3	φ 75 mm × 5
Sputtering direction	Up	Up	Up
Substrate loading capacity	φ 180 mm × 1	φ 200 mm × 1	φ 200 mm × 1
Substrate table	Rotary mechanism
	○	○	○
	Substrate heating
	Substrate table: 300℃	Substrate table: 300℃	Substrate table: 700℃
Film thickness distribution	Within ±5% (φ 50)	Within ±10% (φ 180)	Within ±10% (φ 200)
Transfer method	Transfer rods	Transfer rods	Multiple rods
Vacuum pumping system	Ultimate vacuum pressure
	8.0 × 10⁻⁵ Pa or less	8.0 × 10⁻⁵ Pa or less	8.0 × 10⁻⁵ Pa or less
	Pumping time
	Up to 5.0 × 10⁻⁴ Pa Within 25 minutes	Up to 5.0 × 10⁻⁴ Pa Within 20 minutes	Up to 5.0 × 10⁻⁴ Pa Within 20 minutes
Main pump	Turbo molecular pump	Turbo molecular pump	Turbo molecular pump
Operation mode	Pumping operation
	Automatic	Automatic	Automatic
	Transfer operation
	Manual	Manual	Automatic
Sputtering operation	Semi-automatic (With timer)	Semi-automatic (With timer)	Automatic
Sputtering power supply	RF
	500W	Option	500W
	DC
	—	3kW	3kW
Gas supply system	2 lines	2 lines	2 lines

Model	SRV3100	SRV3300	SRV4320
Model	Parallel plate type	Parallel plate type	Parallel plate type
Target	Cathode type
Target	Planar magnetron	Planar magnetron	Planar magnetron
Size × Quantity	φ 75 mm × 1	φ 75 mm × 3	φ 100 mm × 3
Sputtering direction	Up	Down	Up
Substrate loading capacity	φ 100 mm	φ 190 mm	φ 280 mm
Substrate table	Rotary mechanism
		○
	Substrate heating
	Substrate table: 200℃	Substrate table: 300℃	Substrate table: 300℃
Film thickness distribution	Within ±10% (φ 50)	Within ±10% (φ 180)	Within ±10% (φ 200)
Vacuum pumping system	Ultimate vacuum pressure
	5.0 × 10⁻⁴ Pa or less	5.0 × 10⁻⁴ Pa or less	5.0 × 10⁻⁴ Pa or less
	Pumping time
	Up to 9.9 × 10⁻⁴ Pa Within 20 minutes	Up to 9.9 × 10⁻⁴ Pa Within 20 minutes	Up to 9.9 × 10⁻⁴ Pa Within 20 minutes
Main pump	Oil diffusion pump	Oil diffusion pump	Turbo molecular pump
Operation mode	Pumping operation
Operation mode	Manual	Manual	Manual
	Sputtering operation
	Semi-automatic (With timer)	Semi-automatic (With timer)	Semi-automatic (With timer)
Sputtering power supply	RF
Sputtering power supply	500W	500W	1kW
	DC
	—	Option	Option
Gas supply system	1 lines	2 lines	2 lines