SHINKO SEIKI CO.
Shinko Seiki AAMH Series Horizontal Vapor Deposition System
Manufacturer: Shinko Seiki Co., Ltd.
Model: AAMH Series
Specifications
| Model | AAMH– C1075SB | AAMH– C1080SB | AAMH– C2013SB |
|---|---|---|---|
| Film forming system | |||
| Throughput | 60 x 60 mm substrate: 72 | Φ 3 inch: 60 substrates Φ 4 inch: 45 substrates Φ 5 inch: 14 substrates | 420 × 275 mm substrate: 8 |
| Film thickness distribution | ± 10% | ± 15% | ± 10% |
| Evaporation method | Electron beam gun | Electron beam gun | Electron beam gun |
| Substrate heating | 350°C | 350°C | 350°C |
| Vacuum pumping system | |||
| Ultimate vacuum pressure | 5 × 10-5 Pa or less | 6 × 10-5 Pa or less | 7 × 10-5 Pa or less |
| Pumping time | Up to 10-4 Pa order within 15 minutes | Up to 10-4 Pa order within 15 minutes | Up to 10-4 Pa order within 25 minutes |
| Main pump | Cryo pump | Cryo pump | Cryo pump |
| Operation mode | Fully automatic | ||
