SHINKO SEIKI CO.
Shinko Seiki AMF Series Vapor Deposition Unit For Research And Development
Manufacturer: Shinko Seiki Co., Ltd.
Model: AMF Series
Specifications
| Model | EM– 330S | EM– 435S | AM– 645SB | AMF– 645SB |
|---|---|---|---|---|
| Film forming system | ||||
| Throughput | Φ 3 inch: 4 substrates | Φ 3 inch: 5 substrates | Φ 4 inch: 6 substrates | Φ 4 inch: 6 substrates |
| Film thickness distribution | ± 15% | ± 15% | ± 10% | ± 10% |
| Evaporation method | Resistance heating | Resistance heating | Electron beam gun | Electron beam gun |
| Substrate heating | 350°C | 350°C | 350°C | 350°C |
| Vacuum pumping system | ||||
| Ultimate vacuum pressure | 10-4 Pa order | Up to 10-4 Pa order | 10-5 Pa order | Up to 10-4 Pa order |
| Pumping time | Up to 10-4 Pa order within 20 minutes | Up to 10-4 Pa order within 15 minutes | Up to 10-4 Pa order within 20 minutes | Up to 10-4 Pa order within 20 minutes |
| Main pump | Oil diffusion pump | Oil diffusion pump | Oil diffusion pump | Oil diffusion pump |
| Operation mode | Fully automatic | Fully automatic | Vacuum pumping system: Automatic, Film forming system: Manual | Vacuum pumping system: Automatic, Film forming system: Manual |
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