SHINKO SEIKI CO.
Shinko Seiki STL Series Load-Lock Type Sputtering System
Manufacturer: Shinko Seiki Co., Ltd.
Model: STL Series
Features
- This system uses three cathodes (φ100 mm), thus is capable of forming multiple films.
- Film thickness distribution is φ250 mm ±10%.
- Because the transfer chamber and film forming chamber are always kept under vacuum, throughput time can be shortened.
- This space-saving load-lock type sputtering unit enables real-time process verification from the touch panel.
Specifications
| Model | STL5321 | STL5111 | STL5311 |
|---|---|---|---|
| Type | Parallel plate type | Parallel plate type | Parallel plate type |
| Target | |||
| Cathode type | Planar magnetron | RMC | Planar magnetron |
| Size × Quantity | φ 100 mm × 3 | φ 350 mm × 1 | φ 100 mm × 3 |
| Sputtering direction | Down | Up | Up |
| Substrate loading capacity | φ 27 mm tray × 16 | φ 27 mm tray × 16 | φ 100 mm wafer × 3 |
| Substrate table | |||
| Rotary mechanism | — | Option | ○ |
| Substrate heating | Substrate table: 500℃ | Substrate table: 500℃ | Substrate table: 500℃ |
| Film thickness distribution | Within ±10% (φ210) | Within ±5% (φ200) | Within ±10% (φ90) |
| Transfer method | Robot | Robot | Telescopic arm |
| Vacuum pumping system | |||
| Ultimate vacuum pressure | Up to 2.0 × 10−5 Pa | Up to 2.0 × 10−5 Pa | Up to 2.0 × 10−5 Pa |
| Pumping time | Up to 5.0 × 104 Pa Within 20 minutes | Up to 5.0 × 104 Pa Within 20 minutes | Up to 5.0 × 104 Pa Within 20 minutes |
| Main pump | Turbo molecular pump | Cryo pump | Cryo pump |
| Operation mode | |||
| Pumping operation | Automatic | Automatic | Automatic |
| Sputtering operation | Automatic | Automatic | Automatic |
| Sputtering power supply | |||
| RF | 500W | Option | 500W |
| DC | 3kW | 15kW | 3kW |
| Gas supply system | 2 lines | 2 lines | 2 lines |
