SHINKO SEIKI CO.
Shinko Seiki Vapor Deposition System For Lift-Off Process
Manufacturer: Shinko Seiki Co., Ltd.
Specifications
| Model | AAMF–C1650SBR | AAMF–C2265SBR |
|---|---|---|
| Throughput | φ 3 inch: 7 substrates φ 4 inch: 4 substrates | φ 3 inch: 12 substrates φ 4 inch: 12 substrates |
| Film incident angle | ± 3° (within φ 3 inch) | ± 4° (within φ 3 inch) |
| Film thickness distribution | ± 5% | ± 2.5% |
| Ultimate vacuum pressure | 10−6 Pa order | |
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