SHINKO SEIKI CO.
Shinko Seiki AAMF Series Standard Vapor Deposition System
Manufacturer: Shinko Seiki Co., Ltd.
Model: AAMF Series
Specifications
| Model | AMF–C850SPB | AMF–C1065SPB | AAMF–C1275SPB | AAMF–C2280SPB |
|---|---|---|---|---|
| Film forming system | Throughput | |||
| φ 3 inch: 24 substrates φ 4 inch: 12 substrates | φ 3 inch: 36 substrates φ 4 inch: 18 substrates | φ 4 inch: 48 substrates φ 5 inch: 24 substrates | φ 4 inch: 54 substrates φ 5 inch: 36 substrates | |
| Film thickness distribution | ||||
| ± 10% | ||||
| Evaporation method | ||||
| Electron beam gun | ||||
| Substrate heating | ||||
| 350℃ | ||||
| Vacuum pumping system | Ultimate vacuum pressure | |||
| 4.0 × 10−5 Pa or less | ||||
| Pumping time | ||||
| Up to 10−4 Pa order: Within 15 minutes | Up to 10−4 Pa order: Within 15 minutes | Up to 10−4 Pa order: Within 20 minutes | Up to 10−4 Pa order: Within 20 minutes | |
| Main pump | ||||
| Cryo pump | ||||
| Operation mode | Exhaust system: Automatic, Film forming system: Manual | Fully automatic | ||
※ Various user-selected functions are available.
※ In addition to the above, various sizes are available.
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